Reflector for excimer laser and excimer laser apparatus using the reflector
US4856019A · kind A · utility
31Cited by
10References
12Claims
0Family size
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Key dates
| Filing date | Feb 25, 1988 |
| Grant date | Aug 8, 1989 |
| Priority date | — |
| Expiry date | Feb 25, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflector for an excimer laser is composed of an aluminum layer deposited on a substrate and at least two pairs of dielectric multilayers of high refractive index material and low refractive index material alternately piled on the aluminum layer, and optical thickness of the respective layers of an outer pair of the dielectric multilayers are deviated from .lambda./4 and total optical thickness of the outer pair is made to be .lambda./2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.