Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides
US4857382A · kind A · utility
531Cited by
9References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 26, 1988 |
| Grant date | Aug 15, 1989 |
| Priority date | — |
| Expiry date | Apr 26, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31721
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Polyimides, polycarbonates, polyetherimides and other highly stable organic polymers are photoetched through the use of deep ultraviolet light produced by a broad area, non-coherent, continuous light source. This method is effective in an oxygen-free environment, but provides slightly higher etch rates in an air ambient as a result of the oxygen in the air ambient. The apparatus in which this photoetching occurs may employ a single light source or a plurality of side-by-side lamps and may include ports which allow continuous transport of samples therethrough.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.