Impatt diode
US4857972A · kind A · utility
10Cited by
5References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1987 |
| Grant date | Aug 15, 1989 |
| Priority date | — |
| Expiry date | Sep 28, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D8/40
Abstract
An IMPATT diode having Si-SiGe heterostructure grown on a Si substrate with the SiGe layer being disposed in the generation zone of the IMPATT diode. The SiGe layer may be replaced by a Si/SiGe superlattice.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.