Patent · US Expired

Photosensitive mixture and photosensitive recording material produced therefrom with polymeric compound which is reaction product of unsaturated (thio)phosphinic acid iso(thio)cyanate and active hydrogen containing compound

US4859562A · kind A · utility

4Cited by
13References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 8, 1987
Grant dateAug 22, 1989
Priority date
Expiry dateMay 8, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/111
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photosensitive mixture that contains a photosensitive compound, for example, a photoinitiator or a diazo compound, and a reaction product of a polymer containing active hydrogen with an olefinically unsaturated compound represented by the formula ##STR1## wherein X and Y are the same or different and denote oxygen or sulfur, PA0 R.sub.1 is an olefinically unsaturated aliphatic radical containing 2 to 8 carbon atoms and PA0 R.sub.2 is a saturated aliphatic radical containing 1 to 8 carbon atoms or an aryl radical containing 6 to 10 carbon atoms, is suitable for producing photoresists and printing plates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.