Process for flushing and filling a low pressure gas discharge light source
US4861302A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1988 |
| Grant date | Aug 29, 1989 |
| Priority date | — |
| Expiry date | Jan 21, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/38
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for flushing and filling a low pressure gas discharge lamp which has an exhaust tube and discharge electrodes at each of its ends and which is provided with a discharge vessel for limiting or bounding the gas discharge, wherein the course of the process the discharge vessel is coupled via the exhaust tubes to a pumping apparatus. Flushing or fill gas is continually charged into the discharge vessel via one of the exhaust tubes and simultaneously via the other exhaust tube the gas is discharged in such a manner that within the discharge vessel an equilibrium pressure prevails which coincides with the final charging pressure of the lamp, while the flow rate of the flowing gas is expediently maintained at a constant value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.