Method of forming coating film of fluororesin by physical vapor deposition
US4863762A · kind A · utility
11Cited by
10References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 18, 1988 |
| Grant date | Sep 5, 1989 |
| Priority date | — |
| Expiry date | Mar 18, 2008 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In forming a coating film of a fluororesin, e.g. polytetrafluoroethylene, on a metallic or nonmetallic surface by a physical vapor deposition technique, problems attributed to the necessity of intensely heating or bombarding the fluororesin as the evaporating source or target material are solved by using a molecular weight reduced fluororesin not higher than 5000 in molecular weight. It is best to use a low molecular weight fluororesin powder obtained by heating a high molecular weight fluororesin in presence of a fluorine source and precipitating the molecular weight reduced polymer from the reaction gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.