Offset electrostatic imaging process
US4864331A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1986 |
| Grant date | Sep 5, 1989 |
| Priority date | — |
| Expiry date | Oct 22, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G21/0005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An offset electrostatic imaging process is disclosed which comprises the steps of (a) forming a latent electrostatic image on a dielectric imaging member, said dielectric imaging member being prepared by coating an electrically conductive substrate with a porous layer of a non-photoconductive metal oxide using a deposition process; (b) developing the latent electrostatic image with a developer material which comprises a silicone polymer and from about 0.5 to about 5 percent by weight of a metal salt of a fatty acid; (c) transferring the developed image to an image receiving surface by applying pressure between the dielectric imaging member and the image receiving surface; (d) cleaning the dielectric imaging member using a first cleaning means which is effective to remove developer material residue from above the surface of the porous oxide layer; and (e) further cleaning the dielectric imaging member using a second cleaning means which is effective to remove developer material residue from the pores below the surface of the oxide layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.