Cracking traps for process gas components having a condensed phase
US4867952A · kind A · utility
5Cited by
5References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 1988 |
| Grant date | Sep 19, 1989 |
| Priority date | — |
| Expiry date | May 20, 2008 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0894
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Effluent process gases, particularly those employed in the production and processing of solid state electronic components, are cracked to form products having a condensed phase, which may be separated from the flowing process gas. A plasma trap comprises a high frequency coil for producing a plasma therein. The walls of the trap may be cooled and the trap may employ a removable wall on which the cracked product collects. Particular gases that may be treated are arsine, phosphine, disilane, silane, germane, organometallics and gases containing beryllium and boron.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.