Electron beam and x-ray resists

US4868241A · kind A · utility

Assignee

• American Cyanamid Company · US

Inventors

• Laura J. Hiscock · Norwalk, US
• Bruce H. Baretz · Montclair, US
• Richard L. Webb · Darien, US

Key dates

• Filing date: Dec 29, 1986
• Grant date: Sep 19, 1989
• Expiry date: Dec 29, 2006

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0388
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Polymers are disclosed comprising a poly(vinyl alcohol) backbone with the following groups or combination of groups bound to the backbone: PA1 (A) (substituted alkyl)benzoyl groups; or PA1 (B) (substituted alkyl)benzoyl groups, and (vinyl)benzoyl groups; or PA1 (C) (substituted alkyl)benzoyl groups, and (halo)benzoyl groups or (2-carboxy-3,4,5,6-tetrachloro) benzoyl groups; PA1 (D) (substituted alkyl)benzoyl groups, (vinyl) benzoyl groups, and (halo)benzoyl groups or (2-carboxy-3,4,5,6-tetrachloro)benzoyl groups; PA1 (E) (vinyl)benzoyl groups, and (halo)benzoyl groups or (2-carboxy-3,4,5,6-tetrachloro) benzoyl groups; or PA1 (F) (halo)benzoyl groups. Each of these polymers can optionally contain, bound to the poly(vinyl alcohol) backbone, (trialkylsily) benzoyl groups. The benzoyl groups are randomly bound to the poly(vinyl alcohol) by ester linkages. Residual pendant hydroxy groups remain after the attachment of the benzoyl groups. Also disclosed are the use of these polymers as radiation sensitive resists, such as, for example, x-ray and/or E-beam resists.