Manifold assembly
US4869284A · kind A · utility
10Cited by
10References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 28, 1987 |
| Grant date | Sep 26, 1989 |
| Priority date | — |
| Expiry date | Aug 28, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87684
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas handling manifold for use in metal-organic chemical vapor deposition systems, the manifold having a radial configuration with each vent/run valve equidistant from the center. Ensuring that gases switched simultaneously arrive in a reactor vessel substantially simultaneously, alleviating problems caused by intermediate reactions in the manifold. The manifold has minimal unflushed area (dead volumes) allowing incompatible materials to be handled in tandem.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.