Apparatus for mounting workpieces
US4869801A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 1988 |
| Grant date | Sep 26, 1989 |
| Priority date | — |
| Expiry date | Mar 21, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.