Patent · US Expired

Apparatus for mounting workpieces

US4869801A · kind A · utility

42Cited by
4References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 21, 1988
Grant dateSep 26, 1989
Priority date
Expiry dateMar 21, 2008

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/139
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.