Method of production galvanically deposited aluminum layers for use as contacts of microcircuits
US4869926A · kind A · utility
0Cited by
4References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1987 |
| Grant date | Sep 26, 1989 |
| Priority date | — |
| Expiry date | Mar 17, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K1/0306
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Contacts of microcircuits are produced by galvanically depositing aluminum layers on a substrate carrying a microcircuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.