Photoresist compositions with a bis-benzotriazole
US4871644A · kind A · utility
6Cited by
17References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 22, 1987 |
| Grant date | Oct 3, 1989 |
| Priority date | — |
| Expiry date | Sep 22, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photoresist compositions which operate positively and contain at least one ocmpound of the formula I ##STR1## in which X is --C.sub.n H.sub.2n --, --O--, --S-- or --C(O)--, n being a number from 1 to 6. These compositions are particularly suitable for use as positively-operating copying lacquers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.