Patent · US Expired

Method and apparatus for the ion implantation of spherical surfaces

US4872922A · kind A · utility

19Cited by
8References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 11, 1988
Grant dateOct 10, 1989
Priority date
Expiry dateMar 11, 2008

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S148/90
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method and an apparatus for the ion implantation of spherical surfaces are disclosed. The method essentially includes the provision of a fixture by which a plurality of spherical workpieces are presented to a large area ion beam in a way that their entire respective spherical surfaces are uniformly ion implanted to improve their surface characteristics. The fixture basically includes a solid disc mounted for motion about two axes normal to each other, a plurality of cages formed in a first surface of the disc loosely to accommodate therein a plurality of spherical workpieces, cooling means disposed on a second surface of the disc, and a cover plate and/or mask mounted on the first surface of the disc and provided with a plurality of apertures concentric with the plurality of cages formed in the disc.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.