Patent · US Expired

Photovoltaic cell fabrication method and panel made thereby

US4872925A · kind A · utility

65Cited by
0References
19Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 29, 1987
Grant dateOct 10, 1989
Priority date
Expiry dateOct 29, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50

Abstract

A photovoltaic cell fabrication method and photovoltaic cell including a layer of amorphous silicon sandwiched between a transparent sheet electrode and a back sheet electrode. A third sheet electrode is insulated from the back sheet electrode and makes an electrical connection with the transparent sheet electrode at isolated areas by penetrating a dielectric layer which insulates the back and third sheet electrodes. The third sheet electrode also penetrates the back sheet electrode and the amorphous silicon layer at the isolated areas which, preferably, form an array of dots or point contacts with the transparent sheet electrode. The transparent sheet electrode is preferably disposed on a glass substrate and the point contacts result in an increase in the active area on the light incident surface of the cell. The frequent electrical connections of the third sheet electrode to the transparent sheet electrode result in lower power losses in the cell. The cell can be formed in a single, continuous production machine. A photovoltaic panel is made of a series of at least two of the cells wherein the third sheet electrode of one cell is serially connected to the back sheet electrode of …

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.