Patent · US Expired

Method and apparatus for inspecting reticles

US4875780A · kind A · utility

23Cited by
8References
46Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 25, 1988
Grant dateOct 24, 1989
Priority date
Expiry dateFeb 25, 2008

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2021/95676
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A laser light inspection device for inspecting opposite surfaces of a workpiece with a low angle laser light beam. The laser light beam is directed in successive scans of a first and second sides in a repetitive manner using a pair of dividing mirrors and a pair of low angle mirrors. Light reflected by any debris back toward the direction of origin of the light beam is collected and analyzed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.