Patent · US Expired

Irradiation cross-linkable thermostable polymer system, for microelectronic applications

US4876322A · kind A · utility

45Cited by

8References

1Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Klaus Budde · Unterhaching, DE
Friedrich Koch
Ferdinand Quella · Munich, DE

Key dates

Filing date	Sep 4, 1987
Grant date	Oct 24, 1989
Priority date	—
Expiry date	Sep 4, 2007

Classification

Technology area (CPC H)Electricity
CPC primaryH05K3/4676
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

Linear fluorooligomers having at least two reactive end groups per polymer molecule are incorporated into radiation sensitive polymer systems which have improved continuous temperature resistance and low dielectric constant. The polymer systems can be applied as lacquers. Preferably perfluorated poly-ethers and perfluorated alkanes are used as starting compounds. The polymeric product is usable as a coating for the production of printed multi-layer wirings and economises on through-bores and additional copper intermediate layers. A further field of application exists in the field of integrated semiconductor circuits in VLSI-technology for the production of negative photo-resists.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.