Developer solutions for PMMA electron resist
US4877716A · kind A · utility
1Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 24, 1988 |
| Grant date | Oct 31, 1989 |
| Priority date | — |
| Expiry date | Feb 24, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved developer for PMMA electron resist comprising an effective amount of MEK in combination with MIBK or CS alone or a mixture thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.