Electron-beam exposure apparatus
US4879473A · kind A · utility
8Cited by
6References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1988 |
| Grant date | Nov 7, 1989 |
| Priority date | — |
| Expiry date | Sep 23, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30461
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-beam exposure apparatus having a correction function for correcting deflection distortion. The correction function is carried out by the provision of a correcting device including an analog correction unit 35 and a digital correction unit having a memory unit 10 for storing correction data other than data that can be expressed by a cubic function. The capacity of such a memory unit can be made smaller than that of conventional apparatuses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.