Organometallic compounds
US4880492A · kind A · utility
13Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 1987 |
| Grant date | Nov 14, 1989 |
| Priority date | — |
| Expiry date | Sep 15, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.