Method and device for submicron precision pattern generation
US4880496A · kind A · utility
10Cited by
5References
15Claims
0Family size
Inventors
Key dates
| Filing date | Jun 28, 1988 |
| Grant date | Nov 14, 1989 |
| Priority date | — |
| Expiry date | Jun 28, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3178
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and device for creating patterns on a wide variety of substrates. The dimensions are variable in a wide range, from sub-microscopic and upwards. The device can also be used for microsurgery type manipulations in genetic engineering: a variety of substances can be introduced into biological cells. The production of patterns is based on the guidance of the radiation, electron beam etc. via a tube having a small-diameter tapered end which is metal-coated, and which can be brought to very close proximity of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.