Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves
US4883570A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 8, 1987 |
| Grant date | Nov 28, 1989 |
| Priority date | — |
| Expiry date | Jun 8, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/338
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus and method for creating high temperature plasmas for enhanced chemical processing of gaseous fluids, toxic chemicals, and the like, at a wide range of pressures, especially at atmospheric and high pressures includes an electro-magnetic resonator cavity, preferably a reentrant cavity, and a wave guiding structure which connects an electro-magnetic source to the cavity. The cavity includes an intake port and an exhaust port, each having apertures in the conductive walls of the cavity sufficient for the intake of the gaseous fluids and for the discharge of the processed gaseous fluids. The apertures are sufficiently small to prevent the leakage of the electro-magnetic radiation from the cavity. Gaseous fluid flowing from the direction of the electro-magnetic source through the guiding wave structure and into the cavity acts on the plasma to push it away from the guiding wave structure and the electro-magnetic source. The gaseous fluid flow confines the high temperature plasma inside the cavity and allows complete chemical processing of the gaseous fluids at a wide range of pressures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.