Radiation-sensitive mixture for photosensitive coating materials

US4883740A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhold Schwalm · Monsheim, DE
• Andreas Boettcher · Leimen, DE
• Horst Binder · Lampertheim, DE

Key dates

• Filing date: Jun 30, 1988
• Grant date: Nov 28, 1989
• Expiry date: Jun 30, 2008

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/122
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.