Apparatus for photoresist stripping
US4885047A · kind A · utility
47Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 1988 |
| Grant date | Dec 5, 1989 |
| Priority date | — |
| Expiry date | Jan 11, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm.sup.2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.