Direct measurement of photodiode impedance using electron beam probing
US4885534A · kind A · utility
6Cited by
3References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 1988 |
| Grant date | Dec 5, 1989 |
| Priority date | — |
| Expiry date | Sep 14, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2653
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Photodiode testing apparatus having the capability of directly measuring photodiode impedance. An E-beam machine is used for photodiode testing, the beam being selectively directed to different diodes in an array. A varying level of infrared flux is applied to the photodiode, causing the photodiode to develop ac voltage and current signals which are used for the direct measurement of impedance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.