Electron-beam positive polyimide
US4886734A · kind A · utility
3Cited by
6References
6Claims
0Family size
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Inventors
Key dates
| Filing date | Sep 26, 1988 |
| Grant date | Dec 12, 1989 |
| Priority date | — |
| Expiry date | Sep 26, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An insoluble electron beam positive polyimide having the formula ##STR1## can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.