Thin film manufacturing system
US4887548A · kind A · utility
6Cited by
1References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 13, 1988 |
| Grant date | Dec 19, 1989 |
| Priority date | — |
| Expiry date | May 13, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A thin film manufacturing system comprises a reaction vessel with a window that is transparent to ultraviolet radiation; a means of exhausting gas from the reaction vessel to a reduced pressure condition, a means of introducing a gas into the reaction vessel to form a thin film, a source of ultraviolet radiation that activates the gas, and slits provided at a predetermined interval on the window that is transparent to ultraviolet radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.