Process for the preparation of silicon oxynitride-containing products
US4888159A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 4, 1988 |
| Grant date | Dec 19, 1989 |
| Priority date | — |
| Expiry date | May 4, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/12
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
This invention relates to a process for the preparation of Si.sub.2 N.sub.2 O-containing materials which comprises reacting an amorphous, non-porous silicon dioxide material with flowing, ammonia-containing gas at temperatures of 950.degree.-1300.degree. C. The expression "flowing, ammonia-containing gas" refers to a large number of different gas mixtures which may contain only ammonia or one or more other gases besides ammonia, such as nitrogen, hydrogen, carbon monoxide, carbon dioxide or oxygen. Preferably, pure ammonia or ammonia mixed with the customary uncoverted reaction components of the ammonia synthesis, optionally mixed with traces of carbon dioxide, carbon monoxide or oxygen, is employed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.