Pattern transfer method and silver halide photographic plate to be used for said method
US4891296A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1987 |
| Grant date | Jan 2, 1990 |
| Priority date | — |
| Expiry date | Apr 30, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic plate and a pattern transfer method comprising forming an original picture pattern on a first photographic plate having a silver halide emulsion layer on a glass support and contact transferring the original picture pattern onto a second photographic plate having a silver halide emulsion layer on a glass support or a substrate having a photoresist layer, PA1 characterized in that the first and second photographic plates comprise a silver halide emulsion contained in the emulsion layer which is a silver iodobromide emulsion containing 8 mol % or less of silver iodide and with its mean grain size being 0.1 .mu.m or less; or contain a silver halide emulsion in the emulsion layer which contains 50 mol % or more of silver chloride; and PA1 that at least one of the first and second photographic plates has an emulsion layer with surface roughness of 0.3 .mu.m to 3 .mu.m, and PA1 a silver halide photographic plate to be used for the method. By forming a pattern or a photoresist pattern according to the present invention, a copied pattern of good image quality can be obtained and also the aspirating evacuation time can be reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.