Saponified polyvinyl acetate derivatives which are photosensitive resin compositions
US4891300A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 23, 1987 |
| Grant date | Jan 2, 1990 |
| Priority date | — |
| Expiry date | Sep 23, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition comprising a photosensitive saponified poly(vinyl acetate) derivative containing in the backbone thereof at least one of a first group of photosensitive units which are represented by the general formula (I) ##STR1## wherein represents a vinyl alcohol residue in the backbone of the saponified poly(vinyl acetate) derivative; Y represents a member selected from the group consisting of the following general formulae (II) and (III) ##STR2## m denotes an integer of 1-6; n denotes 0 or 1; R.sub.1 represents a member selected from a hydrogen atom, an unsubstituted alkyl and an unsubstituted aralkyl group, a hydroxyl group, a carbamoyl group, an ether bond and an unsaturated bond; R.sub.2 represents a member selected from a hydrogen atom and a lower alkyl group; and X.sup.- represents an anion, and at least one of a second group of photosensitive units having an ethylenic unsaturated double bond which are represented by the general formulae (IV) and (V) ##STR3## wherein ##STR4## is as defined above; R.sub.3 represents a member selected from a hydrogen atom, a lower alkyl group, a nitrophenyl group, a halogen atom, an aminophenyl group and a phenyl group; …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.