Chamber plate for use in cell fusion and a process for production thereof
US4894343A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1987 |
| Grant date | Jan 16, 1990 |
| Priority date | — |
| Expiry date | Nov 18, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/149
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There are disclosed a chamber plate for use in cell fusion comprising a plate of single crystal silicon on which a plurality of chambers for holding at least a pair of unit cells are formed in array, said chamber having at the bottom a plate having slits which do not pass cells to be held; and a process for producing a chamber plate for use in cell fusion which comprises forming chambers for holding cells in a plate of single crystal silicon by anisotropic etching or isotropic etching by chemical etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.