Patent · US Expired

Chamber plate for use in cell fusion and a process for production thereof

US4894343A · kind A · utility

107Cited by
9References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 18, 1987
Grant dateJan 16, 1990
Priority date
Expiry dateNov 18, 2007

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N15/149
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

There are disclosed a chamber plate for use in cell fusion comprising a plate of single crystal silicon on which a plurality of chambers for holding at least a pair of unit cells are formed in array, said chamber having at the bottom a plate having slits which do not pass cells to be held; and a process for producing a chamber plate for use in cell fusion which comprises forming chambers for holding cells in a plate of single crystal silicon by anisotropic etching or isotropic etching by chemical etching.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.