Gaseous organic/inorganic thermal cracker for vacuum chemical epitaxy
US4900518A · kind A · utility
2Cited by
6References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1988 |
| Grant date | Feb 13, 1990 |
| Priority date | — |
| Expiry date | Dec 2, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A thermal cracking apparatus for cracking organic or inorganic gases is described. More particularly, the thermal cracker cracks inorganic gases such as arsine and phosphine for use in the growth of III-V compound semiconductor layers. The design of the apparatus minimizes the uptake of contaminants into the cracked gas stream.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.