Surface treatment apparatus
US4901667A · kind A · utility
63Cited by
10References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 1986 |
| Grant date | Feb 20, 1990 |
| Priority date | — |
| Expiry date | Aug 1, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/452
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A surface treatment apparatus comprising a vacuum chamber, means for introducing a gas into the vacuum chamber, a gas furnace for heating and activating the gas while it is being introduced, apertures for injecting the heated gas, and a substrate stage for holding a substrate of which the surface is to be treated by the injected gas. The gas that is heated and activated is blown onto the surface of the substrate to treat the surface without causing the surface to be damaged. Therefore, the apparatus can be employed very effectively for a process for producing semiconductor elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.