Radiation sensitive polymeric diazonium salt and methods of making the polymeric diazonium salt
US4902601A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 1989 |
| Grant date | Feb 20, 1990 |
| Priority date | — |
| Expiry date | Jan 19, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: ##STR1## in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.