Patent · US Expired

Method of manufacturing a single crystal of compound semiconductor and apparatus for the same

US4904336A · kind A · utility

8Cited by
4References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 25, 1988
Grant dateFeb 27, 1990
Priority date
Expiry dateApr 25, 2008

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1092
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An apparatus for manufacturing a single crystal of compound semiconductor consisting of Ga and As comprises a crucible storing Ga and having a seed crystal arranged at a lower end portion thereof a gas material susceptor, arranged below the crucible, for storing As, the gas material susceptor and the crucible being arranged in a growth susceptor to be capable of communicating with each other, a main heater for heating and melting Ga in the crucible and for cooling the melt Ga from a lower portion thereof to grow a single crystal, a sub heater for heating and evaporating As in the gas material susceptor and allowing the evaporated As to react with the melt Ga in the said crucible, and a magnetic field applying coil for applying a vertical magnetic field in the melt Ga and As in the crucible so that a surface of the melt in the crucible which is grown to a single crystal is lower in temperature at a central portion thereof than a peripheral portion thereof in a radial direction and at the same time projects upward.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.