Wide area soft vacuum abnormal glow electron beam discharge hardening process
US4904866A · kind A · utility
11Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 17, 1988 |
| Grant date | Feb 27, 1990 |
| Priority date | — |
| Expiry date | Nov 17, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/317
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (<1 us.) pulsed electron beam produced in soft vacuum by an abnormal glow discharge. The pulsed electron beam interacts with the patterned photoresist/polymer resist so as to harden or stabilize the patterns thereon by electron induced cross-linking. The use of a soft vacuum environment allows for both thermal as well as chemically induced hardening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.