Exposure system for image recording apparatus
US4908653A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 1988 |
| Grant date | Mar 13, 1990 |
| Priority date | — |
| Expiry date | Jun 9, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B2227/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system for use in an image recording apparatus includes a photosensitive and pressure-sensitive recording sheet which is sensitive to light in a certain wavelength range. The exposure system also includes a light source disposed on one side of the photosensitive and pressure-sensitive recording medium for applying the light in the predetermined wavelength range to the photosensive and pressure-sensitive recording medium through a first original, and a space region disposed on said one side for accommodating therein an optional exposure unit for optionally exposing the photosensitive and pressure-sensitive recording medium through a second original. The light source is movable while applying the light to the photosensitive and pressure-sensitive recording medium through the first original. The exposure system also includes a rest area for resting the light source out of a light path along which the optional exposure unit exposes the photosensitive and pressure-sensitive recording medium through the second original.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.