Patent · US Expired

Method and photosensitive material for forming metal patterns employing microcapsules

US4910118A · kind A · utility

11Cited by
13References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 28, 1988
Grant dateMar 20, 1990
Priority date
Expiry dateOct 28, 2008

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/185
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Processes for forming metal patterns such as electric circuits and photosensitive materials useful therein are disclosed wherein a layer of photosensitive microcapsules is used to form a pattern of an adhesive, a metallic pigment, a metal salt or a reducing agent by exposing the layer of microcapsules to actinic radiation and transferring the internal phase to a support member. A pattern of the pigment salt or reducing agent is thereby formed on the support member which is treated with an electroless plating solution to form the metal pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.