Antistatic photographic base and light-sensitive element
US4914018A · kind A · utility
8Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 1988 |
| Grant date | Apr 3, 1990 |
| Priority date | — |
| Expiry date | Dec 1, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31986
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved antistatic base comprises a polymeric support film having coated thereon in sequence a first antistatic layer comprising a quaternary polyelectrolyte compound and a polymeric hydrophobic binder and a second protective layer comprising a polymeric hydrophobic binder, wherein said quaternary polyelectrolyte compound is a homopolymer or a copolymer of a diallyldialkylammonium salt compound. The antistatic base is particularly useful as a support for light-sensitive silver halide photographic elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.