Alloy target for manufacturing a magneto-optical recording medium
US4915737A · kind A · utility
5Cited by
3References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1988 |
| Grant date | Apr 10, 1990 |
| Priority date | — |
| Expiry date | Apr 29, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/183
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An alloy target for making a magneto-optical recording medium by sputtering comprises an alloy containing 10 to 50 atom % of at least one rare earth element selected from among Sm, Nd, Gd, Tb, Dy, Ho, Tm and Er, with a balance consisting substantially of at least one transition metal selected from among Co, Fe and Ni. The alloy has a mixed structure composed of at least three phases of intermetallic compounds formed by the rare earth element and the transition metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.