Method for producing amorphous metal layer
US4915980A · kind A · utility
5Cited by
13References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 12, 1989 |
| Grant date | Apr 10, 1990 |
| Priority date | — |
| Expiry date | Jul 12, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S148/09
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method metallurgically bonds a thin film of easily amorphized material on a metallic substrate having a large thermal conductivity, and then irradiates all or selected portions of the thin film with a pulse laser. The irradiated portions become amorphous by rapidly heating and cooling. Therefore, a whole surface which is an amorphous layer or a part of a surface which is an amorphous layer is obtained. In the latter, a porous amorphous metal layer is obtained by subsequent acid elution and by removing the non-amorphous part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.