Photosensitive recording element containing an ionic polymer

US4916045A · kind A · utility

Assignee

• BASF SE

Inventors

• Horst Koch · Havelsee, DE
• Wolfgang Mueller · Wappingers Falls, US
• Reiner Hofmann · Neustadt, DE
• Peter Richter · Karlstein, DE

Key dates

• Filing date: Mar 30, 1989
• Grant date: Apr 10, 1990
• Expiry date: Mar 30, 2009

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/106
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The invention provides a novel photosensitive recording material in the shape of a multilayer element comprising PA0 (i) a photopolymerizable or photocrosslinkable relief-forming layer (RL) of a thickness from 0.1 to 6000 .mu.m and PA0 (ii) a dimensionally stable support layer. The said relief-forming layer (RL) consists essentially of an ionic polymer, of one or more photoinitiators and, if desired, of one or more photopolymerizable monomers. The said ionic polymer contains PA1 (A) from about 45 to 90% by weight, based on the ionic polymer, of a polymer main chain formed from an alkadiene polymer A', PA1 (B) from about 6 to about 45% by weight, based on the ionic polymer, of one or mored olefinically unsaturated side radicals having the structure (I), ##STR1## where R.sup.1 and R.sup.2 are different and are each H or a carbon atom of A', PA0 R.sup.3 is a polyvalent, straight-chain or branched C.sub.1 -C.sub.20 -alkylene radical whose chain or branches may be interrupted by --O--, --N-- or --S--, PA0 X is --O--, --S-- or --NH--, PA0 Y is a polar group, PA0 Z is --CH.sub.2 --, --O--, ##STR2## R.sup.4 is H or CH.sub.3, Q is --COOH or --COO.sup..crclbar., PA0 m is an integer from 1 to…