Organometal-containing compounds
US4916247A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 29, 1988 |
| Grant date | Apr 10, 1990 |
| Priority date | — |
| Expiry date | Aug 29, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F30/04
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Organometal-containing styrene derivatives of the formula I ##STR1## in which, for example, M is Si, X is 0, R.sup.1 and R.sup.2 are hydrogen, R.sup.4 to R.sup.6 are each methyl, a is zero and R.sup.7 is hydrogen or methyl, and organometal-containing compounds of the formula VII ##STR2## in which M and R.sup.1 to R.sup.6 are, for example, as defined above and Y is, for example, 4-nitrophenoxy, are valuable starting materials for the preparation of organometal-containing polymers. The polymers are suitable for the preparation of photoresists which can be developed under dry conditions, such as are required in the production of structured images, particularly in microelectronics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.