Process gas supply piping system
US4917136A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 24, 1988 |
| Grant date | Apr 17, 1990 |
| Priority date | — |
| Expiry date | May 24, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/4259
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention relates to the supply piping system of the process gas for various types of thin-film making and fine pattern dry etching process, and more particularly to the process gas supply system, which makes it possible to form high quality thin films and to perform high quality etching. Specifically, when there are a unit in operation with process gas supplied and a unit not in operation with no process gas supplied in a process gas supply piping system, supplying the process gas to two or more process units from a cylinder cabinet piping system, this invention provides a gas supply piping system, where the process gas supply piping line to the process unit not in operation can be purged with purge gas all the time and where gas flows all the time through all of gas supply piping lines to eliminate the stagnation of gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.