High intensity laser radiation protection
US4917481A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 6, 1988 |
| Grant date | Apr 17, 1990 |
| Priority date | — |
| Expiry date | Jun 6, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high intensity laser radiation protection system is characterized by the use of a thin film reflector structure which is operable to terminate transmission of optical signals to an optical sensor in response to high intensity laser radiation. The thin film reflector includes a glass substrate having a thin layer of radiation absorption material applied thereto with a thin layer of reflective metal film applied to the absorption layer. The absorption layer has a low melting and vaporization temperature, and the layer of metal film has a thickness affording passage of a limited amount of laser radiation to the absorption layer. When laser radiation having a predetermined intensity is received by the absorption layer, the absorption layer rapidly melts and destroys the metal film layer to terminate optical transmission to the optical sensor, thereby preventing damage to the sensor from the laser radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.