Defraction photoelectric position measuring system
US4923300A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1988 |
| Grant date | May 8, 1990 |
| Priority date | — |
| Expiry date | Feb 18, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Several photoelectric position measuring systems are described which utilize diffraction gratings to define the reference magnitude. Diffracted component beams are introduced by means of coupling-in gratings that have different grid constants from one another into optical waveguides to a coupler and there brought into interference. The interfering component beams are conducted from the outputs of the coupler via optical waveguides to detectors which transform them into electrical signals which are phase-shifted with respect to one another. Displacement of the diffraction grating is a measure for the position change to be measured of one machine component mounted for translation relative to another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.