Process for the chemical vapor deposition of aluminum
US4923717A · kind A · utility
49Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1989 |
| Grant date | May 8, 1990 |
| Priority date | — |
| Expiry date | Mar 17, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for forming aluminum films is provided comprising employing the techniques of chemical vapor deposition to thermally decompose a vapor comprising a aluminum hydride subsequent to the treatment of the substrate with a Group IVB or VB metal complex, so as to deposit a mirror-like coating of aluminum on the surface of a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.