X-ray mirror and production thereof
US4924490A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 24, 1989 |
| Grant date | May 8, 1990 |
| Priority date | — |
| Expiry date | Jan 24, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
An X-ray mirror having its layer structure in the sequence of: a substrate having the surface roughness (R.sub.max) of 1,000 .ANG. or below; an intermediate layer of high molecular weight material formed on this substrate and having a surface roughness (R.sub.max) of 100 .ANG. or below; and a thin film formed on this intermediate layer, the X-ray mirror being produced by the process steps of: providing a substrate having a surface roughness (R.sub.max) of 1,000 .ANG. or below; forming on this substrate an intermediate layer of a high molecular weight material by spin-coating with a surface roughness (R.sub.max) of 100 .ANG. or below; and finally forming a thin film on this intermediate layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.