Patent · US Expired

Anti-radiation covering for electronic components

US4925772A · kind A · utility

11Cited by

4References

14Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Ferdinand Quella · Munich, DE
Oskar Nuyken · Munich, DE
Klaus Budde · Unterhaching, DE
Thomas Suefke · Langen (Hessen), DE

Key dates

Filing date	Nov 4, 1988
Grant date	May 15, 1990
Priority date	—
Expiry date	Nov 4, 2008

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A cover layer for micro-electronic components and VLSI circuits is provided for protecting the components and circuits against alpha radiation. The cover layer is produced by ultraviolet cross linking of a negative resist, wherein, as a constituent for absorbing the alpha rays, the negative resist contains a substituted triphosphazene of the formula (I) whose organic radicals are bonded to phosphorus via oxygen and wherein, on a statistical average, 1 through 3 radicals have cross-linkable, light-sensitive groups. The cover layer provided good protection from alpha rays, has low shrinkage during curing and, given high thermal resistance, can be combined when mixing with other negative resists. ##STR1##

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.