Apparatus for coating a substrate
US4928627A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 9, 1987 |
| Grant date | May 29, 1990 |
| Priority date | — |
| Expiry date | Jul 9, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A coating applicator is provided for depositing a film on a surface of glass and other substrates by chemical vapor deposition. The applicator includes a pair of opposing coating nozzles for applying a vaporized coating chemical reactant in a carrier gas to the surface at such a concentration and velocity that coating of the surface is achieved under substantially reaction rate controlled conditions. Each coating nozzle is positioned adjacent the surface with a small clearance therebetween which is open to the outside atmosphere. The opposing coating nozzles are directed toward each other at a selected angle with respect to a normal to the surface of the substrate. The angle and the clearance provides a condition where there is substantially no intermixing of coating vapors with the outside atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.